Deck 32: Microfabrication Technologies
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Deck 32: Microfabrication Technologies
1
Microsystem technology is concerned with products and product components whose feature sizes are measured in microns.A micron is equal to which one of the following:
A)10-2 cm
B)10-3 cm
C)10-4 cm
D)10-5 cm
E)10-6 cm
A)10-2 cm
B)10-3 cm
C)10-4 cm
D)10-5 cm
E)10-6 cm
10-4 cm
2
Which of the following are current applications of microsensor technology in modern automobiles (three best answers):
A)air-bag release sensors
B)alcohol blood level sensors
C)driver identification sensors for theft prevention
D)oil pressure sensors
E)temperature sensors for cabin climate control
A)air-bag release sensors
B)alcohol blood level sensors
C)driver identification sensors for theft prevention
D)oil pressure sensors
E)temperature sensors for cabin climate control
air-bag release sensors
oil pressure sensors
temperature sensors for cabin climate control
oil pressure sensors
temperature sensors for cabin climate control
3
The polymer used to make compact discs (CDs) and digital versatile discs (DVDs) is which one of the following:
A)amino resin
B)epoxy resin
C)polyamides
D)polycarbonate
E)polyethylene
F)polypropylene
A)amino resin
B)epoxy resin
C)polyamides
D)polycarbonate
E)polyethylene
F)polypropylene
polycarbonate
4
The most common work material used in microsystem technology is which one of the following:
A)boron
B)gold
C)nickel
D)potassium hydroxide
E)silicon
A)boron
B)gold
C)nickel
D)potassium hydroxide
E)silicon
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5
The aspect ratio in microsystem technology is best defined by which one of the following:
A)degree of anisotropy in etched features
B)height-to-width ratio of the fabricated features
C)height-to-width ratio of the MST device
D)length-to-width ratio of the fabricated features
E)thickness-to-length ratio of the MST device
A)degree of anisotropy in etched features
B)height-to-width ratio of the fabricated features
C)height-to-width ratio of the MST device
D)length-to-width ratio of the fabricated features
E)thickness-to-length ratio of the MST device
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6
Which of the following forms of radiation have wavelengths shorter than the wavelength of ultraviolet light used in photolithography (two correct answers):
A)electron beam radiation
B)infrared light
C)natural light
D)X-ray radiation
A)electron beam radiation
B)infrared light
C)natural light
D)X-ray radiation
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7
Bulk micromachining refers to a relatively deep wet etching process into a single-crystal silicon substrate:
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8
Surface micromachining refers to a relatively shallow layering process in the silicon substrate:
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9
In the LIGA process, the letters LIGA stand for which one of the following:
A)let it go already
B)little grinding apparatus
C)lithographic applications
D)lithography, electrodeposition, and plastic molding
E)lithography grinding and alteration
A)let it go already
B)little grinding apparatus
C)lithographic applications
D)lithography, electrodeposition, and plastic molding
E)lithography grinding and alteration
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10
The LIGA process uses which of the following radiation forms (two best answers):
A)electron beam radiation
B)infrared light
C)ion beams
D)ultraviolet light
E)X-ray radiation
A)electron beam radiation
B)infrared light
C)ion beams
D)ultraviolet light
E)X-ray radiation
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11
Soft lithography refers to processes that use an elastomeric flat mold (similar to a rubber stamp) to create a pattern on a substrate surface:
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12
Photofabrication is the same process as photolithography.
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