Indicate Whether Each of the Following Descriptions Better Applies to Patterning

Short Answer

Indicate whether each of the following descriptions better applies to patterning by lateral inhibition (L), reaction-diffusion systems (R), or sequential induction (S). Your answer would be a four-letter string composed of letters L, R, and S only, e.g. SSRR.
( ) It does NOT generate asymmetrical patterns from an initial noisy field.
( ) It is based on short-range activation and long-range inhibition.
( ) It can readily generate complex patterns resembling the spots of a leopard or stripes of a zebra.
( ) It is commonly mediated by Notch signaling.